Double Exposure Mask Aligner (DS series)

Features:
‧High Quality Exposure Optics
‧High Resolution Capability
‧High Precision Alignment Stage
‧Double side Exposure Stage
‧Wedge Error Compensation
‧Reasonable Price
‧PLC Control
‧Precise Gap Setting
‧Reliable and Stable
‧Substrate thickness: 0.35mm at least
More Details

Specs:

Light Source
* 350 Watt UV power supply
* Wavelength : 350nm-450nm 
* 365 nm Beam Intensity : 15-20 mW/cm2 
* Uniform Beam Size:  4.0" Diameter 
* Beam Uniformity: ±5% over 4" Diameter
* Beam Angle < 2.0 deg
* 365nm/405nm sensors feedback control
 
Top Side Microscope System
* Four lens Alignment System 
* Two lens for alignment key, Two lens for edge alignment
* Image Magnification : 80x-500x (L-R)
* Two 19 inch monitors with image splitter
* LED coaxial illumination
* Lens movement range XYZ : 20mm 
* Prism Block: alignment mark down to 15mm
Alignment Stage
* Substrate X, Y travel range: 10mm
* Bottom mask X, Y  travel range: 5mm
* θ rotation range: ±10 deg
* Proximity gap range : 0-3mm
* Accuracy: 2um 
* With Proximity and Contact exposure mode 
* Wedge Error Compensation (WEC) 
 
Operating Interface
* PLC control .
* Exposure timer setting up to 999.9 sec.
* Switch for easy mask change.
* Emergency stop button.
 
Accessory
*Mask Holder
*Substrate clamp
*Substrate thickness: 0.35mm at least
*Substrate material: specified
* Anti-vibration Table
* Vacuum pump
 
UV Lamp
*350/500W Hg Arc lamp
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