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Alloying Furnace (RC-800)
Applicaton:
Alloying Contacts To Semiconductor Samples Under Controlled Conditions
Features:
*Easy access to temperature controlled specimen stage.
*Compact furnace for temperatures up to 750°C.
*Controlled melting using optical observation system.
*In situ oxide removal prior to melting contact material.
*Range of alloys available for use with the equipment.
Alloying Contacts To Semiconductor Samples Under Controlled Conditions
Features:
*Easy access to temperature controlled specimen stage.
*Compact furnace for temperatures up to 750°C.
*Controlled melting using optical observation system.
*In situ oxide removal prior to melting contact material.
*Range of alloys available for use with the equipment.
More Details
Specs:
1.Environmental Chamber:
Borosilicate Glass 60mm dia x 80mm high Gas inlet and outlet. Quick release fixing into furnace base.
2.Specimen Stage:
40mm dia Circular Quartz Stage, Low mass heater.
3.Temperature Control:
Digital Controller interactive with timer. Maximum stage temperature 750°C.
4.Timer:
0-99.99 hours
5.Gas Handling System:
Flowmeters fitted with associated valves